Deadline for Applications: May 3 (early decision); June 7, 2019
The Stanford U.S.-Russia Forum (SURF) is now accepting applications for the 2019-20 program!
The Stanford U.S.-Russia Forum is a platform for students to address the most pressing issues and opportunities between the United States and Russia. They are seeking members for research working groups in the areas of nuclear affairs, entrepreneurship, space exploration, climate and environment, counterterrorism, healthcare, the Arctic, energy geopolitics, security, and more.
This November, participants will attend a week-long conference in Russia. Following the fall conference, participants form working groups and collaborate on research for publication over the academic year. The program concludes with a capstone conference in April 2020 where research findings are presented and ideas are shared with academics, policy-makers, governmental and non-governmental agencies, and other interested parties.
The conference last fall included speakers like US Ambassador Jon Hunstman Jr. and Russian Foreign Minister Sergei Lavrov, tours of Skoltech and Boeing, and even a visit to the Tyumen Region in Siberia. The capstone conference concluded last week and meetings included Secretary William J. Perry, California Governor Jerry Brown, American Ambassadors to Russia, NASA, the Kennan Institute, the Heritage Foundation, Congress, Penn-Biden Center and more.
Applications are welcomed from graduate and undergraduate students in all academic disciplines and majors, regardless of prior exposure to Russia. Recent graduates and young professionals will also be considered. The program will cover most expenses, including housing and local transportation. Participants are responsible for expenses including flight and visa costs. There is no registration or participation fee for our program.
The early decision deadline is on Friday, May 3, 2019, at 11:59 PM PT and our application will fully close by Friday, June 7, 2019, at 11:59 PM PT. Applications are being reviewed on a rolling basis.