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You are here: Home / Seminars / Archived Seminars / 2015-16 Seminars / Digital Photoelasticity Applied to Implant Dentistry

Seminar Schedule – Fall 2015


Friday, October 30, 2015
Time: 3:30-4:30 PM
Place: WRW 102

Digital Photoelasticity Applied to Implant Dentistry

K. Ramesh – Indian Institute of Technology, Madras, INDIA

Implant dentistry has been practiced over several centuries. There have been several strides now and there are methods available to put all the teeth permanently using ‘All-on-four’ concept. Stress analysis has greatly helped in preventing failures due to bone resorption. Phtoelasticity has been the primary choice of the dentists as the coloured fringe patterns are the indicators of stress level. Hitherto the photoelastic analysis has been simple and confined to point by point analysis. Identification of a suitable model itself is a challenge in implant dentistry. A simple procedure to develop residual stress free 3D model has been developed. Using this approach two cases are analysed on dealing with All-on-four concept and the other on influence of various abutments. The advances in Digital photoelasticity have been fully exploited to analyse the complex model domain and fringe patterns. Modern technological developments like rapid prototyping and virtual reality have made in-roads to implant dentistry and their role in conjunction with digital photoelasticity would be brought up in the talk.

For further information, please contact Dr. K. Ravi-Chandar at ravi@utexas.edu or (512) 471-4213.

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