The developed roll-to-roll graphene dry transfer machine with simultaneous speed and tension control. Peeling angle control is achieved with model predictive control based on a peeling mechanics model that includes adhesion energy estimation.
With peeling speed and tension control in the R2R dry transfer process, surface resistance of 9.5 kΩ/sq is achieved on PET/EVA, allowing the fabrication of flexible graphene-based field effect transistors (GFETs) with 100 times lower gate leakage current and near-zero doping level compared with those fabricated using wet etched graphene samples.