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substrate cleaning-AMI clean acetone rinse methanol rinse IPA rinse Omnicoat spin-coating 500 rpm, 5s, 100 rpm/s 3000 rpm, 40s, 300 rpm/s Bake at 200 deg. for 1 min Repeat this process at least two (~26nm expected for 2 layers) 3 times recommended -> Microchem suggest 3 layers of Omnicoat coating SU8-3005… read more 

We must apply the omnicoat to cover all the wafer. If not, omnicoat covers incompletely. If you want to more details about the processing of the omnicoat, please refer the attached document.