Advancement in epitaxial growth techniques is one of the major factors responsible for the compound semiconductor technology momentum today. Our group focuses on the development of MetalOrganic Chemical Vapor Deposition (MOCVD) of various compound semiconductors for high performance electronic and photonic devices, and fundamental understanding of epitaxial growth mechanism in selective are epitaxy (SAE), vapor-liquid-solid (VLS) and van der Waals epitaxy.
