Chang Group awarded NSF grant to develop indium based resists for EUV Lithography

The Chang Group along with teams from UT Dallas (Prof. Julia Hsu, Prof. Kevin Brenner, Prof. Cormac Toher) and Johns Hopkins University (Prof. Howard Katz) have been co-awarded an NSF FuSe2 grant to develop indium based inorganic resists for extreme ultraviolet (EUV) lithography. The project aims to create innovative materials for next-generation semiconductor manufacturing, enabling smaller and more precise chip features. This research will contribute to advancing chip performance and energy efficiency, supporting the evolving demands of the semiconductor industry.